Purchase of Maskless Laser Lithography System Tender

• Country: United Kingdom
• Summary: Purchase of Maskless Laser Lithography System
• GBT Ref No: 134664754
• Deadline: 11 Feb 2026
• Financier: Self Financed
• Purchaser Ownership: Government
• Tender Value: Refer Document
• Notice Type: Tender
• Document Ref. No.:
• Purchaser's Detail:
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• Description:
• The Institute for Compound Semiconductors (ICS) intends to procure a maskless laser lithography system to support essential expansion of its hybrid electro‑optical lithography capability. The system will enable processing in which wafers are exposed using both electron‑beam lithography and optical radiation within the same resist layer(s), or across multiple aligned resist layers. ICS has previously invested €2.5 M in a state‑of‑the‑art electron beam lithography platform capable of patterning nanoscale features down to 10 nm. To fully realise the benefits of hybrid lithography workflows, ICS requires a complementary optical lithography system capable of producing large‑area exposures (several millimetres) with feature sizes down to approximately 300 nm, while maintaining extremely high positioning and overlay accuracy with respect to electron‑beam‑defined structures. The required system must incorporate: a high‑resolution optically encoded stage with positioning fidelity on the order of 1 nm; the capability for stitch‑free patterning across full wafers up to 200 mm in diameter; demonstrated overlay accuracy of approximately 15 nm (optical‑to‑electron‑beam alignment); software and workflow compatibility to support integrated hybrid lithography between electron‑beam and optical exposures. ICS has undertaken a technical review of the market and believes that only one supplier Raith can provide a maskless laser lithography system meeting these combined requirements for stage prec...
• Documents:

 Tender Notice